In this paper , fluorocarbon films are deposited on polyetylene terephalate ( pet ) substrate by radio frequency magnetron sputtering polytetrefluoroethylene ( ptfe ) targets to examine the effect of discharge condition on the properties and mechanism of deposited films . the effect of the power , pressure and treating time on morphology is observed by means of scanning electron microscopy ( sem ) and atom force microscopy ( afm ) . it is found that the fluorocarbon film particles distribute more uniform and join tightly with increasing power , the surfaces of films become closer and denser as pressure increases 利用扫描电镜( sem )和原子力显微镜( afm )研究了成膜机理以及cf膜的表面形貌，观察了不同功率、压力和时间下对氟碳膜表面形貌的影响，系统研究了氟碳膜表面结构随功率和压力的变化规律，发现功率提高使得氟碳膜颗粒分布均匀，结合更加紧密，而提高压力，氟碳膜的颗粒更加密集，并且溅射条件不同，粒子的形态、粒子间构成的介观结构也不相同。
Further measurements for the deposited films indicate that the appearance and the deposition rate of the films also vary . after we simulate the magnetic field in such case with c program , these variations are owed to distributed change of magnetic field near the target surface and in the discharging space , which can influence the motion of charged particles in the plasma obviously 进一步对沉积薄膜的测量表明，薄膜的沉积速率等发生了变化，通过对空间磁场进行模拟计算发现，由于空间外加的纵向磁场引起了放电空间中以及靶面附近磁场分布的改变，影响了等离子体中带电粒子的运动并最终导致了上述变化。
Various factors affecting the refractive index and the deposition rate of the deposited films are studied to optimize growth conditions of the films . the microstructures and optical properties of the films are characterized by a prism coupler , a fourier transform infrared spectroscopy ( ftir ) and an atom force microscopy ( afm ) 研究了薄膜折射率和淀积速率与工艺参数之间的关系，通过棱镜耦合仪、傅立叶变换红外光谱、原子力显微镜、扫描电子显微镜等测试手段，分析了薄膜的结构和光学特性。
Ge - sio2thin films were prepared by an rf co - sputtering technique on p - si substrates from a ge - sio2 composite target . the as - deposited films were annealed in the temperature range of 300 - 1000 under nitrogen ambience . the structure of films was evaluated by x - ray diffraction ( xrd ) , x - ray photoernission spectroscopy ( xps ) 当温度较低时(沉积时的基片温度ts 450 ，后处理退火温度ta 800时，制备的样品均为非晶结构，当温度较高时( ts 450 ， ta 800 )薄膜样品中才出现si的结晶颗粒。
A hydrogen and argon ions mixing beam was implanted into the deposited vanadium oxide film . after annealing , vo2 film with tcr ( temperature coefficient of resistance ) as high as 4 % was obtained . the bombardment of ar + could break v - o bond of v2o5 molecule in deposited film and implanted h + resulting in the deoxidization of v2o5 , so the vo2 thin film could be prepared by proper control of the dose of ar + / h + implantation 利用离子束增强沉积设备，在ar ~ +离子束对v _ 2o _ 5靶溅射沉积的同时，用氩、氢混合束对沉积膜作高剂量的离子束轰击，使得被氩离子轰击后断键的氧化钒分子，再被注入氢降价，然后经适当的退火，成功地制备了热电阻温度系数高达4的vo _ 2薄膜(国外报道值为2 - 3 ) ，并研制了单元悬空结构探测器和8 1 ， 16 1线性阵列。
Abstract : the deposited film with magnesium / polytetrafluoroethylene ( mg / ptfe ) material is produced by physical vapor deposition . the infrared radiation property of mg / ptfe material is tested by using the infrared radiation meter . the results demonstrated that this material has stronger infrared radiation in 1 3 m wave length . it shows that produced infrared radiation pyrotechnic material by physical vapor deposition is feasible 文摘:采用物理汽相沉积法设计制作了镁/聚四氟乙烯沉积膜材料，并用红外辐射计对其红外辐射性能进行了测试，测得该材料在1 3 m波段有较强的红外辐射，说明这种方法制作红外辐射烟火材料是可行的。
Both the dielectric layer and metal film were internally deposited on the fiber . it is found that ag is able to engender the highest ir reflectivity among the metal materials , so ag is ascertained as the metal layer material of the hollow waveguide , cop was used in this work as the dielectric material . based on countless calculations , optimum thickness for the deposited films were obtained , namely , 0 . 2 / / m for ag layer and 1 . 4 fan for the cop layer 实验用来制备空芯光纤的基管材料为石英基管；内径为1mm ；通过理论推导与分析发现：相对于其它的金属材料而言，金属银的红外反射率最高，因此金属银最适合用做制备空芯光纤的金属膜层的材料；通过比较几种聚合物的性质确定选择环烯聚合物cop为电介质层材料；通过理论推导与计算确定了金属银膜与电介质膜的最佳理论厚度，即银膜为0 . 2 m ， cop膜的厚度为1 . 4 m 。
It shows the nanometer particles have automation to make the friction surface in a comparatively even state . 4 ) through tribology chemistry function , the nanometer cacoj and cao particles form a deposited film on the wear scar ' s surface or strengthen the surface through a small amount of metal ca ' s diffusion to improve the friction surface ' s a （ 4 ）纳米碳酸钙和纳米氧化钙粒子通过摩擦过程中的摩擦化学作用在磨斑表面上形成了沉积膜，少量金属钙通过扩散作用渗透到钢基体表面，形成表面强化层，提高了表面的耐磨性。
The best process for high quality tio _ ( 2 ) thin film deposited on k9 glass by reb is studied by using orthogonal test method , the se results indicate that the best process for tio _ ( 2 ) thin film deposition is the substrate temperature of 300 , the total gas press in the chamber of 2 x 10 ~ 2pa and the deposition rate of 0 . 2 nm - s - 1 , of which the substrate temperature has influence on the optical properties of the deposited films notably 文中首先以tio _ 2薄膜的折射率和消光系数为研究对象，采用l9正交试验法研究了在k9玻璃上制备高光学质量tio _ 2薄膜的最佳工艺条件。椭圆偏振仪的测试结果表明，制备tio _ 2薄膜的最佳工艺条件为：基片温度300 ，工作真空2 10 ~ ( - 2 ) pa ，沉积速率0 . 2nm ? s ~ ( - 1 ) ，其中基片温度对薄膜光学常数的影响最大，该结果具有较好的可重现性。
Copper has been deposited on surface of the al mmcs as interlayer by magnetron sputtering , tlp bonding of al mmcs with these interlays , the joints shear strength of tlp bonding using deposited film was as much as the joint shear strength of tlp bonding using cu foil . removing the oxidation on the surface before deposition , copper was coated by magnetron sputtering as tlp bonding interlayer 待连接表面通过磁控溅射法沉积铜膜作为中间层进行瞬间液相连接，得到的接头强度与铜箔中间层进行瞬间液相连接得到的接头强度相当，而使用磁控溅射法去除待连接表面氧化膜后沉积铜膜作为中间层进行瞬间液相连接的接头强度提高7 . 6左右。
